Recently, the U.S. Department of Energy's Office of Science released the report "The Future of Electron Sources," pointing out the future of electron sources for X-ray Free Electron Laser (XFEL), Ultrafast Electron Diffraction (UED) and Ultrafast Electron Microscopy (UEM) . The development of next-generation instruments, ranging from hard X-ray free electron lasers to ultrafast electron scattering instrumentation, will strongly rely on the breakthrough advances in electron sources. From 8 to 9 September 2016, the Office of Basic Energy Sciences (BES) hosted a Future E-Source Symposium at the National Accelerator Laboratory at the Stanford Linear Accelerator Center (SLAC) to determine future source requirements for XFEL, UED and UEM And future research and development opportunities, more than 60 experts from the National Laboratory, academia and international agencies attended the seminar. The Future of E-Sources report is a summary of the seminar. The report notes that advances in all major technical areas of electron sources need to meet the needs of future X-ray and electron scattering instruments. Nanotechnology and materials designed through this have great promise in changing photocathodes and gun technology needs to be made even more Good progress to maintain the brightness of the initial beam. The report identifies four priority research directions. 1, the next generation of high brightness beam cathode research and development. Two key factors for bright beam currents are the longitudinal and transverse energies at launch, which can be reduced by more than 10 times in many ways, including material engineering, cooling of the cathode substrate, and tuning of the laser wavelength. Testing advanced photocathodes in a real gun environment is crucial to translate this research into direct improvements in electron beam quality. In addition, exploring the use of nano- and micro-optoelectronic emitters greatly improves beam coherence. The ab initio design of the cathode allows the custom-made photocathode to be used for new applications in high-brightness beam currents. 2, the development of continuous wave injector to significantly increase the cathode acceleration gradient and the output beam energy. Continuous wave implanters need to more than double the gradient of cathode acceleration and electron beam energy to produce and maintain the high brightness electron beam required for XFEL and single UEM. Addressing these challenging needs requires significant advances in copper materials and RFIC continuous-wave technology. Technical calculations should be done from start to finish to narrow the technology choices. 3, the next generation of high-gradient electron source research and development. Pulse electron guns feature very high initial acceleration gradients (on the order of 100 MV / meter), relatively low repetition rates (about 200 Hz), and average beam current. Advances in new structures and materials are expected to achieve more than double the source electric field and record high peak brightness. 4, advanced accelerator and beam control concept of research and development. It is recommended to develop electron guns based on the concept of advanced accelerators, such as laser or beam plasma wake-up or terahertz, as they may achieve GV / meter injection fields. The application of advanced phase space beam control schemes can reduce the technical risk and cost of XFEL by more than an order of magnitude. In addition to the priority research directions described above, beam diagnostics, beam dynamics and laser technology should also be studied. Advances in electron sources and related technologies will enable the development of new instruments and equipment that will enable the study of matter at fundamental temporal and spatial scales to reinvigorate the science of X-ray and electron scattering.
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